Other S3IPFacilities
This facility consists of an x-ray photoelectron spectroscopy (XPS) system for chemical analysis, scanning probe microscope (SPM) and profilers for 3D micro and nanostructural characterization, and a spectroscopic ellipsometer for optical properties and thin film thickness measurements. The XPS system is capable of micro and macro XPS analysis with the new focused x-ray spot technology as well as depth profiling, chemical state imaging, x-ray induced electron imaging and angle resolve analysis. The SPM is a multi-technique system equipped with AFM, conductive-AFM, MFM, SCM, nano-manipulation, nano-indentation, force modulation, fluid imaging capabilities. Ultra-high vacuum STM/AFM provides 3D atomic resolution imaging. The suite also contains stylus and optical profilers for 3D feature size, step height, surface roughness measurements. Spectroscopic ellipsometer can be used for thin film thickness measurements, 3D mapping and optical properties such as refractive index measurements.
